Abstract:

The ability to measure the sizes and concentration of particles in colloidal suspensions has been a challenge particularly for suspensions with particles smaller than 100 namoneters. A new measurement technique has been developed that allows for measurement of particles as small as 5 nanometers. The technique has demonstrated the ability to provide unique and useful particle size distribution (PSD) data for chemical/mechanical planarization (CMP) slurries used heavily in the micro-electronics industry. The ability to measure filter retention of particles in the 10-20 namometer size range has also been demonstrated.