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A High Flow Filter for UPW Applications – A Field Case Study

Authors

Gary Van Schooneveld, CT Associates Inc.

Peter Nadolny, W.L. Gore & Associates, Inc

Abstract

The International Technology Roadmap for Semiconductors (ITRS) continues to identify the need for reduced particle contamination in ultrapure water (UPW) used in the manufacturing of microelectronic devices. According to the roadmap, critical feature sizes already demand control of particles smaller than 50 nanometers (nm). By 2015, the critical particle size is projected to be less than 20 nm(1).

To meet these demands, filter manufacturers are striving to improve the retention performance and cleanliness of their filters. Typically, the improved retention resulting from refinements to the microstructure of the membrane comes at the expense of increased pressure drop across the filter. However, recent advances in membrane technology have yielded filters with both improved particle retention and significant reduction in pressure drop. This case study will review the performance in an ultrahigh purity water system of a new 20 nm, 10 inch expanded polytetrafluoroethylene (ePTFE) cartridge filter.

CTA Publication #89 – Ultrapure Water Journal, Volume 26, Number 3, March 2009, pp.29-33

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