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Evaluation of Particle Shedding and Trace Metal Extraction of Four Centrifugal Pumps

Authors

Mark R. Litchy and Gary Van Schooneveld,
CT Associates, Inc.

Reto Schoeb,
Levitronix GmbH

Abstract

As semiconductor feature sizes continue to decrease, the production of these devices becomes increasingly sensitive to particulate and metallic contamination. As a result, the need for high purity components with low particulate and metallic contamination becomes evermore apparent. Particle shedding from pumps may degrade the performance or lifetime of filters used in the process loop or reduce product yield. Furthermore, metallic contamination in process chemicals may reduce product yield.

In this experiment, four high capacity centrifugal pumps designed for aggressive chemical and high purity applications were evaluated for particle shedding in ultra pure water and trace metal extraction in hydrochloric acid. The four centrifugal pumps evaluated were from three different pump manufacturers. Particle shedding from the pumps were evaluated at typical operating conditions. In addition, the pumps were evaluated for trace metal extraction using a dynamic extraction method in 35% hydrochloric acid. Both surface and bulk contamination were quantified with this method. Furthermore, the type and rate of trace metal extraction were determined for each pump. Comparisons of pump cleanliness will be presented.

2011 CMP and Ultrapure Users Conference

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